The nuclear pore membrane is formed by drilling holes and chemically etching holes in insulating materials with heavily charged particles. When the etchable range of heavy charged particles in an insulating material film is greater than the film thickness, the radiation damage generated on each vertically incident path of heavy charged particles can be preferentially etched by chemical methods to form ratio channels (micropores) that penetrate the insulating film. An insulating film with one or more of these penetrating micropores is called a nuclear pore membrane. The heavy charged particles used to manufacture nuclear pore membranes are divided into two categories: one is the heavy charged particle beam generated by heavy ion accelerators, and the other is fission fragments, which can be produced by fission targets placed on neutron beams in nuclear reactors.
